Photoresists are photosensitive resins that are used in the lithography process to transfer circuit patterns, such as those for semiconductors, on a silicon wafer. They form circuit patterns on the surface of a silicon wafer with photochemical reaction caused by light irradiation through a photomask on which the circuit patterns are drawn. Shin-Etsu photoresists support advanced lithography using the light source from i-line, KrF, ArF to EUV. We also provide spin-on middle/under-layer hardmasks used in the nanofabrication process.