Photoresists are photosensitive resins that are used in the lithography process to transfer circuit patterns, such as those for semiconductors, on a silicon wafer. They form circuit patterns on the surface of a silicon wafer with photochemical reaction caused by light irradiation through a photomask on which the circuit patterns are drawn. Shin-Etsu photoresists support advanced lithography using the light source from i-line, KrF, ArF to EUV. We also provide spin-on middle/under-layer hardmasks used in the nanofabrication process.

Series Name

  • SIPR series, SEPR series, SAIL series, SEVR series, SHB series, ODL series


  • Semiconductor manufacturing process
  • Magnetic head manufacturing process
For Inquiries About This Product
  • Company:
    Shin-Etsu Chemical Co., Ltd.
  • Department:
    New Functional Materials Div. New Functional Materials Dept. β… 
  • Phone: