Photomask blanks

Photomask blanks, which are the base material of photomasks that are light-shielding thin films on a synthetic quartz substrate, are used as the patterning template of circuits to be transferred on a silicon wafer in the semiconductor lithography process. Shin-Etsu meets customers’ requests with a wide range of product lines including OMOG (Opaque MoSi on Glass) blanks using MoSi binary as light-shielding film with excellent etching properties instead of conventional Chromium (Cr) binary, and half-tone phase shift photomask blanks.