Photomask blanks
Photomask blanks, which are the base material of photomasks that are light-shielding thin films on a synthetic quartz substrate, are used as the patterning template of circuits to be transferred on a silicon wafer in the semiconductor lithography process. Shin-Etsu meets customers’ requests with a wide range of product lines including OMOG (Opaque MoSi on Glass) blanks using MoSi binary as light-shielding film with excellent etching properties instead of conventional Chromium (Cr) binary, and half-tone phase shift photomask blanks.
![](https://www.shinetsu.co.jp/wp-content/uploads/2019/03/★Blanks_006.jpg)
Applications
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Company:Shin-Etsu Chemical Co., Ltd.
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Department:New Functional Materials Div. New Functional Materials Dept. Ⅱ
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Phone:+81-3-6812-2451