Photomask blanks

Photomask blanks, which are the base material of photomasks that are light-shielding thin films on a synthetic quartz substrate, are used as the patterning template of circuits to be transferred on a silicon wafer in the semiconductor lithography process.
Shin-Etsu meets customers’ requests with a wide range of product lines including OMOG (Opaque MoSi on Glass) blanks using MoSi binary as light-shielding film with excellent etching properties instead of conventional Chromium (Cr) binary, and half-tone phase shift photomask blanks.

Applications

  • Photomasks for integrated circuits
For Inquiries About This Product
  • Company:
    Shin-Etsu Chemical Co., Ltd.
  • Department:
    New Functional Materials Div. New Functional Materials Dept. Ⅱ
  • Phone:
    +81-3-3246-5346