Shin-Etsu Chemical Co., Ltd.

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Research and Development

Research and Development Policy

Our R&D challenge - creating original ideas to turn today's dreams into tomorrow's reality

Without new challenges a company cannot grow. Shin-Etsu Chemical values the power of R&D as an important asset that leads as we carve a path into the future. While asking ourselves, "What do our customers need now?" and "What is the market looking for?" we continuously engage in research and development to fulfill present demands. All the while we are actively pursuing further research to raise the quality and production efficiency of our previously developed products.


The Triangular Link: Sales, R&D and Production

Shin-Etsu Chemical's R&D is being directed in a way that closely suits our customers' needs. What makes this possible is Shin-Etsu's R&D system, which integrates business, development and production. Market demands generated by our business activities are relayed to our development divisions, where they are used to establish research themes. The development divisions follow these themes as they progress. At the same time they maintain close ties with the manufacturing divisions and conduct practical R&D aimed at utilizing our plants and facilities for mass production. In order to do this efficiently, Shin-Etsu Chemical has established R&D centers at each plant, which ties them in closely with each business and manufacturing division.


Materials Development with Originality - Creating New Value

In conducting our R&D, we focus on original themes. Our first goal with these themes is to meet the next generation of needs and, secondly, show originality in doing something that has never been attempted. Some of these carefully selected themes have led to the invention of new materials that we were the first to mass produce. These materials have solved problems in various industrial fields by providing unique properties and excellent functionalities, while leading to industry-changing breakthroughs. We will continue to take on the challenge of developing new materials wherever the need exists.

Products and Research and Development History

Year Development history
1927 Naoetsu Plant begins production of carbide and lime nitrogen fertilizer
1939 Manufacture of ferrosilicon begins
1953 Silicone production facilities established
1957 PVC, caustic soda and chlorine production begins
1960 Manufacture of high-purity silicon begins
Production of vinyl acetate and polyvinyl alcohol starts
1962 Manufacture of cellulose derivatives begins
1963 Production of plaster-use hi-Metolose begins
1965 Gastrosoluable coating agent pharmacoat developed
1967 Start of manufacture of high-purity yttrium and other rare earths
1972 Rare-earth magnets developed
Production of HPMCP begins
1973 Epoxy molding compounds developed
1976 Irone synthetic aroma developed
1977 Commercialization of L-HPC
1979 Production of synthetic quartz glass for IC photomask begins
1980 Synthetic pheromones developed
1981 Silicon nitride powder developed
Cast iron wire inoculation agent developed
1982 HEMC production begins
1984 Lithium tantalate (LT) developed
1985 Ultra-high-purity PBN development
PVC shrink film developed
1986 Materials for flexible printed circuit boards developed
1991 High-performance neodymium-iron-boron magnets produced commercially
1993 Preform manufacturing for optical fiber begins
1994 Protective covers and pellicles for photomask developed
1998 Commercialization of photoresist
1999 Liquid fluoroelastomer developed
2000 Optical communication component business launched
2001 300mm silicon wafer production initiated
2005 New high-performance technology for neodymium rare earth magnets developed
2007 Optical isolators complying with the RoHS Directive developed
Leading-edge photomask blanks developed with Toppan Printing
2008 2008 The world’s largest class permanent magnet-type magnetic circuit developed
2009 Silicone reflector material for high brightness LEDs developed
2013 "RADIBARRIER" series of liquid silicone rubber with radiation-shielding properties developed

Introduction of Research Center