Synthetic quartz glass substrates

Shin-Etsu Chemical is a top-ranking manufacturer of synthetic quartz photomask substrates for IC and synthetic quartz large photomask substrates for LCD. For over 20 years, we have offered a stable supply of top quality substrates. Synthetic quartz wafers mainly used in high-temperature poly-Si TFT-LCD are now available up to 300mmφ in diameter, meeting the wide range of requirements from customers.

Product Introduction

Synthetic quartz photomask substrates

This substrate excels in the permeability and low thermal expansibility in the far-ultraviolet range. It is suitable as photomask substrates for optical lithography and other applications that require ultra-high purity and high precision polishing (flatness processing at a submicron level).

-Features-

• It has ultra-high purity, and contains no bubble, foreign matter and stria.
  Surface defects: For IC 1m (SZS grade) and 2m (SMS grade). For LCD 2m (SMS grade).
  Flatness: Various lineups are available.

-Lineup-

• Synthetic quartz photomask substrates for IC
  • Synthetic quartz photomask substrates for g line, i line, KrF (248nm) lithography
  • Synthetic quartz photomask substrates for ArF (193 nm) lithography
  • Synthetic quartz photomask substrates for F2 (157 nm) lithography
• Synthetic quartz photomask substrates for LCD
  • Synthetic quartz photomask substrates for TFT
  • Synthetic quartz photomask substrates for Color Filter

 

Synthetic quartz wafers

This wafer has excellent thermal resistance and light transmission properties. It is most suitable as wafers for high temperature poly- Si TFT-LCD and other applications that require high purity and high precision polishing.

 

-Features-

• It is an ultra-high grade product free from bubble and foreign matter.
• Compared with ordinary glass, it possesses a low thermal expansion and extremely high permeability over the whole wavelength range from ultraviolet to infrared region.
• We have two grades for wafers, which are VIOSIL-SQ and VIOSIL-SX. VIOSIL-SQ is same material as synthetic quartz photomask substrate.VIOSIL-SX is improved material for heat resistance to support the use in the high temperature range (1,000 or higher).

-Lineup-

• External diameters from 3"(76.2 mm) to a maximum of 12"(300 mm) are included in the lineup. Other sizes are also available.

 

Product Data

• Synthetic Quartz Glass Substrates(PDF)
  
• Synthetic Quartz Photomask Substrates for ArF Lithography (PDF)
  
• Synthetic Quartz Glass Substrates for Micro-chips and Bio-chips(PDF)
  
• Finished products of Shin-Etsu's synthetic glass(VIOSIL)(PDF)
• Synthetic Quartz Glass Substrates for Nano-Imprint Templates(PDF)

Product Column

LCD panels are finding more and more applications from wall-hanging displays to personal computers. With increasing application of these devices, users are demanding larger sizes and ever finer images. Larger screens, naturally, require more elements: several million placed at intervals of less than 10 micron meters from each other. To achieve size, high resolution and clarity, electrical circuits controlling voltages to the crystals must be manufactured with perfect precision. The basic material for the photo mask used to etch the ultra fine circuit patterns on the display panel is synthetic quartz: The material of choice.

Contact

Opto-Electronics Materials Dept. II
Advanced Materials Division
Phone : +81-3-3246-5222
Facsimile : +81-3-3246-5366