Photomask blanks are the base material of photomasks that are used as the patterning templates of circuit during the semiconductor lithography process. The light-shielding layer is formed on the surface of photomask blanks whose substrate is synthetic quartz.
Instead of Chromium (Cr) used for conventional light-shielding layer of photomask blanks, Shin-Etsu has developed the new manufacturing processes to use cutting-edge Molybdenum-Silicon Binary (OMOG: Opaque MoSi On Glass) for light-shielding layer. Shin-Etsu has established the mass-production technology of such most advanced photomask blanks with its superior etching characteristics. Shin-Etsu’s photomask blanks are highly evaluated by device makers as an essential material for cutting-edge semiconductor manufacturing processes.
In addition, Shin-Etsu supplies attenuated phase-shift photomask blanks for ArF and KrF, which respond to customers’ needs.
-Features-
- We use our own quartz substrate for the photomask blanks that is high quality material refined in the synthetic quartz field.
- Our chemical amplified resist coated on the photomask blanks is also developed by our own outstanding technology for semiconductor photoresists.
- We supply diversification of product lines that combines our own quartz substrates, our own chemical amplified resists, and state of the art layer forming technology.
New Functional Materials Department
Phone : +81-3-3246-5346
Facsimile : +81-3-3246-5724
