Pellicle is a high-quality cover for the protection of photomasks against dust, which was developed based on the know-how accumulated from the development and manufacture of various electronic materials. In addition to the grade for g/i-line and the KrF excimer laser grade, the ArF excimer laser grade is also available. Through consolidated quality design, we are equipped to meet all
the high level needs of our customers.

-Features-

• Pellicle membrane has high transmission and excellent laser durability.
• Adhesives for fixation of the membrane and for mounting on photomask have excellent light resistance quality, and were developed independently by our own technology.
• Special processing of the frame surface prevents generation of particles.
• Pellicle container was uniquely designed and is made of antistatic and dust-free materials (adaptable to auto-mounter).

 

Contact

Special Functional Products Dept.
Phone : +81-3-3246-5345
Facsimile : +81-3-3246-5724