Excimer laser-use photoresists

Shin-Etsu Chemical has merchandised photoresists for excimer lasers as a photosensitive material used in inscribing semiconductor circuitry, and also met success in developing pellicles, which are the protective dust covers used for photomasks with excimer lasers. In this way, the Shin-Etsu Group has been able to build up a system for supplying the principal materials needed in the lithography process for manufacturing semiconductor devices.

Photoresist spin-coated onto a wafer.

Photomask blanks are the base material of photomasks that are used as the patterning templates of circuit during the semiconductor lithography process. The light-shielding layer is formed on the surface of photomask blanks whose substrate is synthetic quartz.